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Hagberg, Erik C. and Hart, Mark W. and Cong, Lianhui and Allen, Christopher W. and Carter, Kenneth R.. (2007) Cyclophosphazene-containing Polymers as Imprint Lithography Resists. Journal of Inorganic and Organometallic Polymers and Materials, 17 (2). pp. 377-385. ISSN 1574-1443
LaFontaine, B. M. and Naulleau, P. P. and Daga, V. K. and Lin, Y. and Watkins, J. J. and Okoroanyanwu, U. and Petrillo, K. and Ashworth, D. and Peng, H. G. and Soles, C. L.. (2011) Additive-loaded EUV photoresists: performance enhancement and the underlying physics. In: Extreme Ultraviolet. Proceedings of SPIE, 7969 . SPIE.
Lee, JaeJong and Lee, SangRok. (2010) Nanoimprint Technology for Large Area Patterning and Its Applications. In: New England Nanomanufacturing Summit 2010, June 22 - 24, 2010, Lowell, MA. (Unpublished)
Morse, Jeffrey. National Nanomanufacturing Network. (2010) NENS 2010: Nanomanufacturing Stakeholders Provide Insights into Challenges, Benefits, and Societal Impact. NNN Newsletters, 3 (6).
Moran, Isaac W. and Jhaveri, Sarav B. and Carter, Kenneth R.. (2008) Patterned Layers of a Semiconducting Polymer via Imprinting and Microwave-Assisted Grafting. Small, 4 (8). pp. 1176-1182. ISSN 16136810
Moran, Isaac W. and Cheng, Dalton F. and Jhaveri, Sarav B. and Carter, Kenneth R.. (2008) High-resolution soft lithography of thin film resists enabling nanoscopic pattern transfer. Soft Matter, 4 (1). pp. 168-176. ISSN 1744-683X