Morse, Jeffrey. National Nanomanufacturing Network. (2010) NENS 2010: Nanomanufacturing Stakeholders Provide Insights into Challenges, Benefits, and Societal Impact. NNN Newsletters, 3 (6).
NNN_newsletter_3-6_June10.html - Published Version
NNN_newsletter_3-6_June10.pdf - Published Version
The New England Nanomanufacturing Summit 2010 (NENS 2010) held June 22-24 in Lowell, MA included technical discussions by scientists, experts, and industries in the field of nanomanufacturing by stakeholders from academic institutions, government, and industries in the Northeast, along with national and international participants. The event provided key insights into challenges and potential benefits of nanotechnology and nanomanufacturing, and further engaged stakeholders and attendees in networking discussions and opportunities. Fostering such interactions enables broader understanding by all stakeholders and participants on the challenges associated with transitioning nanoscience research to commercially viable consumer products. Also: When Top-Down Meets Bottom-Up: EUV and X-ray Interference Lithography for Sub-20-nm Features; NNI Strategic Planning Stakeholder Workshop To Take Place July 13 - 14, 2010; New England Nano Event Addresses Environmental Health and Safety Topics.
|Uncontrolled Keywords:||NNI, New England Nanomanufacturing Summit,|
|InterNano Taxonomy:||Nanomanufacturing Processes > Nanopatterning/Lithography > Extreme ultraviolet (EUV) lithography
Nanomanufacturing Processes > Nanopatterning/Lithography > Interference lithography
Areas of Application > Electronics and Semiconductor Industries
|Collections:||National Nanomanufacturing Network Archive > NNN Newsletters|
|Depositing User:||Rebecca Reznik-Zellen|
|Date Deposited:||08 Mar 2011 18:22|
|Last Modified:||08 Mar 2011 18:22|
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