Srituravanich, W. and Durant, S. and Lee, H. and Sun, C. and Zhang, X.. (2005) Deep subwavelength nanolithography using localized surface plasmon modes on planar silver mask. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 23 (6). pp. 2636-2639. ISSN 0734211X
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The development of a near-field optical lithography is presented in this paper. By accessing short modal wavelengths of localized surface plasmon modes on a planar metallic mask, the resolution can be significantly increased while using conventional UV light source. Taking into account the real material properties, numerical studies indicate that the ultimate lithographic resolution at 20 nm is achievable through a silver mask by using 365 nm wavelength light. The surface quality of the silver mask is improved by adding an adhesion layer of titanium during the mask fabrication. Using a two-dimensional hole array silver mask, we experimentally demonstrated nanolithography with half-pitch resolution down to 60 nm, far beyond the resolution limit of conventional lithography using I-line (365 nm) wavelength.
| Item Type: | Article |
|---|---|
| InterNano Taxonomy: | Nanoscale Objects and Nanostructured Materials > Nanocomposites > Thin films Nanomanufacturing Processes > Nanopatterning/Lithography Nanomanufacturing Characterization Techniques > Scanning Probe Microscopy > Near-field scanning optical microscopy (NSOM) |
| Collections: | Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Scalable and Integrated Nanomanufacturing |
| Depositing User: | Moureen Kemei |
| Date Deposited: | 22 Mar 2010 21:31 |
| Last Modified: | 26 Sep 2014 18:15 |
| URI: | http://eprints.internano.org/id/eprint/355 |
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