Cyclophosphazene-containing Polymers as Imprint Lithography Resists

Hagberg, Erik C. and Hart, Mark W. and Cong, Lianhui and Allen, Christopher W. and Carter, Kenneth R.. (2007) Cyclophosphazene-containing Polymers as Imprint Lithography Resists. Journal of Inorganic and Organometallic Polymers and Materials, 17 (2). pp. 377-385. ISSN 1574-1443

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Abstract

We present the evaluation of a cyclophosphazene-containing polymer as a patternable resist for imprint lithography. Hexamethacryloxybutoxycyclotriphosphazene layers containing small amounts of photoinitiator can be applied to silicon wafers substrates by spin coating techniques and cured photochemically to give tough, network polymer thin films. The films were characterized by FT-IR. Thin films approximately 200 nm in thickness were subjected to anisotropic O2 and CF4 plasmas and the etch rates were determined. The polymer films etch at a rate of 21 Å/s in CF4 plasma, and as low as 1.6 Å/s in O2 plasma, which is comparable or lower than the rates observed with commercially available silicon-containing photoresists. The surface chemical composition was surveyed by X-ray photoelectron spectroscopy, which gave results consistent with the formation of an etch resistant phosphorus-rich layer during reaction with O2 plasma. The polymer was processed by nano-contact molding imprint lithography and replicated 200 nm period test patterns. This report is the first demonstration of a cyclophosphazene-containing polymer as a resist candidate for high-resolution lithography.

Item Type: Article
InterNano Taxonomy: Nanoscale Objects and Nanostructured Materials > Nanocomposites > Thin films
Nanomanufacturing Processes > Nanopatterning/Lithography > Extreme ultraviolet (EUV) lithography
Nanoscale Objects and Nanostructured Materials > Nanocomposites > Polymeric
Nanomanufacturing Processes > Nanopatterning/Lithography
Collections: Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Hierarchical Manufacturing
Nanomanufacturing Research Collection
Depositing User: Moureen Kemei
Date Deposited: 01 Feb 2010 20:18
Last Modified: 19 Sep 2011 20:50
URI: http://eprints.internano.org/id/eprint/251

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