Chen, Hung-Ting and Crosby, Todd A. and Park, Myoung-Hwan and Nagarajan, Sivakumar and Rotello, Vincent M. and Watkins, James J.. (2009) Accessibility of cylindrical channels within patterned mesoporous silica films using nanoparticle diffusion. Journal of Materials Chemistry, 19 (1). pp. 70-74. ISSN 0959-9428
Full text not available from this repository. (Request a copy)Abstract
Mesoporous silica films with well ordered nanochannels (approximately 7 nm in diameter) oriented parallel to the substrate were synthesized using supercritical carbon dioxide mediated silica deposition within templates comprised of triblock copolymers blended with strongly associating homopolymers. The films were patterned at the device level by conventional lithography and etched to yield periodic circular features approximately 20 µm in diameter. The nanoscale channels remained accessible to penetrant diffusion as shown by dye uptake experiments. The nanochannel arrays were used as miniature size exclusion columns to mediate nanoparticle diffusion.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | SOFT LITHOGRAPHY; K DIELECTRICS; THIN-FILMS; NANOLITHOGRAPHY; NANOSTRUCTURES; MESOPHASES; TEMPLATES; GROWTH; OXIDES |
| InterNano Taxonomy: | Nanomanufacturing Processes > Nanopatterning/Lithography > Block copolymer lithography Nanoscale Objects and Nanostructured Materials > Nanostructured Materials Nanoscale Objects and Nanostructured Materials > Nanocomposites > Thin films Nanomanufacturing Processes > Deposition of Nanostructured Films or Nanostructures Nanomanufacturing Processes > Nanopatterning/Lithography |
| Collections: | Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Hierarchical Manufacturing Nanomanufacturing Research Collection |
| Depositing User: | Moureen Kemei |
| Date Deposited: | 22 Feb 2010 15:29 |
| Last Modified: | 19 Sep 2011 20:39 |
| URI: | http://eprints.internano.org/id/eprint/295 |
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